Tibco News, according to Taiwan’s Economic Daily News, Merck announced today (8) that it is working with Micron Technology to develop a gas solution for semiconductor processes that can reduce global warming trends.
Merck said that after a year of continuous cooperation, Micron Technology is currently testing a low GWP alternative etch gas provided by Merck’s R&D department to verify its process performance, thereby replacing traditional high GWP materials and aiming to introduce new and more sustainable gas solutions in the semiconductor process. Both companies are working to identify novel materials that will help achieve sustainability goals by replacing a variety of high warming potential etch gases currently used in dry etch and photomask cleaning processes.
To achieve the goal of reducing carbon emissions from global operations by 42% by 2030 (compared to 2020), Micron Technology is investing in advanced emissions reduction systems, prioritizing the use of lower GWP gases, outsourcing energy-efficient equipment, and replacing energy with renewable petrochemicals, said John Whitman, vice president of Micron Technology.
