Canon recently issued a press release and began selling chip production equipment FPA-1200NZ2C, stating that it can manufacture 5 nm chips using a solution different from complex photolithography technology.
Canon said that the working principle of this production equipment is different from that of industry leader ASML. It is not photolithography, but more similar to printing. It does not use the principle of image projection to transfer the microstructure of the integrated circuit to the silicon wafer.
The equipment can be applied to silicon wafers as small as 14 square millimeters, allowing the production of chips equivalent to the 5nm process.
Canon said it will continue to improve and develop this system and is expected to be used to produce 2nm chips in the future.
Note: Nanoprinted lithography is generally considered a low-cost alternative to optical lithography, and memory chip manufacturers such as SK Hynix and Kioxia have tried to use it in the past. Kioxia had previously conducted tests, but potential customers complained that the product had a high defect rate and ultimately gave up.
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