ASML CEO Peter Wennink recently said in an interview with Reuters, that despite some obstacles to suppliers, the company will still be in accordance with previously set plans to deliver High NA EUV machines by the end of the year.
ASML said a High-NA EUV lithography machine is the size of a truck, with a price tag of more than $300 million per machine (currently about RMB 2.19 billion), which can meet the needs of first-tier chipmakers to make smaller, better chips in the next decade.
Wennink said some suppliers have been unable to improve the quantity and quality of components, which has led to slight delays, but overall these difficulties are manageable, promising to deliver the first machine by the end of this year.
In the post-3nm era, ASML and its partners are developing a new EUV lithography machine, the Twinscan EXE:5000 series, which will feature a 0.55 NA (high NA) lens with a resolution of up to 8nm to minimize double or multiple exposures in the 3 nm node and beyond. The machines will have 0.55 NA (high NA) lenses with a resolution of up to 8 nm, thus avoiding double or multiple exposures at 3 nm and above.
